A3030 Phoenix Systems feature innovative technologies for the most exacting process requirements.
Refined continuously over time, ASI's Phoenix Systems with Progressive Offset 'fixed spray technology" offer distinct production advantages over competing systems. The Phoenix system consistently produces ultra-fine etch results and process uniformity on both top and bottom of panels.
Engineering tests utilizing line width mapping on a high-end visualization system reveal superior results between the A3030 Phoenix System with the fixed spray array and competitive oscillating equipment. The patterns were applied to conventional copper foils using dry film photo resists.
In the first example, etched on the A3030 Phoenix System, the test shows a color pattern that is very flat, translating to an average line width of 3.31 mils, with a total deviation of 0.03. These results clearly represent a superior etch tool for consistent production of fine line circuitry.
In the second example, etched on competitive oscillating equipment, the test shows wide variations in the color pattern, indicating severe deviations over standard accepted criteria. The average line width is 3.14 mils, but some areas are as much as .5 mils larger or .4 mils smaller than the average. This result is unacceptable in today's highly competitive market.
Over time, the direct costs of poor quality and scrapped panels can seriously impact your profits and production schedules. Advanced ASI Phoenix technologies assure optimum results time after time, even for thin material products.
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